| 摘要 |
The present invention relates to a spray nozzle unit and a substrate cleaning device having the same, and, more particularly, to a spray nozzle unit and a substrate cleaning device having the same, capable of spraying a liquid to an exact position without an external influence and improving process efficiency. The spray nozzle unit includes a body part fixated to a chamber base; a nozzle unit arranged in the body part to spray the liquid to a substrate; and a height adjusting unit for adjusting the height of the nozzle unit. In this case, the spray nozzle unit further includes a support for collecting a leaked or remaining liquid after the liquid is sprayed on the substrate. In addition, the substrate cleaning device includes a chamber for receiving the substrate; a chamber base arranged at a lower end of the chamber; and the spray nozzle unit. With the above configuration, the liquid can be sprayed at the exact position of the substrate without the external influence. In addition, the leaked or remaining liquid after the cleaning process has been finished is collected, thereby preventing an inner part of the chamber from being contaminated due to the liquid. |
