| 摘要 |
Provided is an imaging device that appropriately exposes phase-detection pixels to perform phase-detection AF with high precision. A system control unit (11) selects, from among phase-detection pixels (51R, 51L) in a selected AF area (52), phase-detection pixels appropriate to the position of the selected AF area (52) in a row direction (X). The system control unit (11) then determines exposure conditions on the basis of output signals from the selected pixels. An out-of-focus-amount computation unit (19) computes an out-of-focus amount using output signals from the phase-detection pixels (51R, 51L) in the selected AF area (52), said output signals being part of a taken-image signal obtained by using an imaging element (5) to take an image using the exposure conditions determined by the system control unit (11). |
