VACCUM DEPOSITION APPARATUS

摘要

Disclosed is a vacuum deposition apparatus. The vacuum deposition apparatus, according to the present invention, includes a vacuum chamber unit where the deposition of a substrate is conducted; a door for opening and closing a vacuum space of the vacuum chamber unit; a deposition source unit arranged on the vacuum chamber unit, movably along with the door, to provide a deposition source to the substrate; and an isolation unit for connecting the door and the deposition source unit to limit the movement of the deposition source unit caused by the movement or a deformation of the door while the vacuum chamber unit is closed by the door.