| 摘要 |
A method for matching the impedance of the output impedance of a high-frequency power supply arrangement to the impedance of a plasma load includes, in a first impedance matching mode, matching the impedance of the output impedance of the high-frequency power supply arrangement by changing the frequency of the high-frequency signal produced. If the frequency is outside a specified frequency range, in a second impedance matching mode the impedance of the output impedance of the high-frequency power supply arrangement is matched by mechanically or electrically modifying a circuit which is arranged downstream of the high-frequency signal producer. |
