| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning operation which is sufficient to clean or strip a contaminated surface without producing a large amount of chemical waste.SOLUTION: A cleaning apparatus is provided that includes a first nozzle 220 configured to direct a cleaning jet 222 towards a contaminated surface 234 at a pressure sufficient to remove contaminants from the contaminated surface 234. At least one second nozzle 242 is configured to direct a rinsing jet 262 towards the contaminated surface 234 to remove cleaning fluid from the contaminated surface 234. The rinsing jet 262 is directed at a pressure sufficient to isolate the cleaning jet 222 from an ambient environment. |
