发明名称 COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, PROCESS OF MANUFACTURING P-TYPE DIFFUSION LAYER, AND PROCESS OF MANUFACTURING SOLAR CELL ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a composition for forming a p-type diffusion layer capable of forming a p-type diffusion layer while suppressing generation of internal stress in a silicon substrate and warpage of the substrate in a manufacturing process of a solar cell element using a silicon substrate, and preventing a lifetime of carriers from largely lowering at a substrate having a p-type diffusion layer obtained thereby, and to provide a process of manufacturing a p-type diffusion layer and a process of manufacturing a solar cell element.SOLUTION: The composition for forming a p-type diffusion layer includes: a glass powder, containing an acceptor chemical element, in which a total amount of lifetime killer chemical elements is 1000 ppm or less; and a dispersion medium. By coating the composition for forming a p-type diffusion layer and performing a thermal diffusion treatment, a p-type diffusion layer and a solar cell element having the same are manufactured.
申请公布号 JP2014099660(A) 申请公布日期 2014.05.29
申请号 JP20140035733 申请日期 2014.02.26
申请人 HITACHI CHEMICAL CO LTD 发明人 MACHII YOICHI;YOSHIDA MASATO;NOJIRI TAKESHI;OKANIWA KAORU;IWAMURO MITSUNORI;ADACHI SHUICHIRO;SATO TETSUYA;KIZAWA KEIKO
分类号 H01L31/04 主分类号 H01L31/04
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