发明名称 |
Apparatus And Methods For Backside Passivation |
摘要 |
Provided apparatus and methods for back side passivation of a substrate. The systems comprise an elongate support with an open top surface forming a support ring so that when a substrate is on the support ring, a cavity is formed within the elongate support. A plasma generator is coupled to the cavity to generate a plasma within the cavity to deposit a passivation film on the back side of the substrate. |
申请公布号 |
US2014147990(A1) |
申请公布日期 |
2014.05.29 |
申请号 |
US201314087815 |
申请日期 |
2013.11.22 |
申请人 |
HAWRYLCHAK LARA;TOBIN JEFF |
发明人 |
HAWRYLCHAK LARA;TOBIN JEFF |
分类号 |
H01L21/3105 |
主分类号 |
H01L21/3105 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|