发明名称 SCHOTTKY STRUCTURE EMPLOYING CENTRAL IMPLANTS BETWEEN JUNCTION BARRIER ELEMENTS
摘要 The present disclosure relates to a Schottky diode having a drift layer and a Schottky layer. The drift layer is predominantly doped with a doping material of a first conductivity type and has a first surface associated with an active region. The Schottky layer is provided over the active region of the first surface to form a Schottky junction. A plurality of junction barrier elements are formed in the drift layer below the Schottky junction, and a plurality of central implants are also formed in the drift layer below the Schottky junction. In certain embodiments, at least one central implant is provided between each adjacent pair of junction barrier elements.
申请公布号 US2014145289(A1) 申请公布日期 2014.05.29
申请号 US201213686119 申请日期 2012.11.27
申请人 CREE, INC. 发明人 ZHANG QINGCHUN
分类号 H01L29/872 主分类号 H01L29/872
代理机构 代理人
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