| 摘要 |
Disclosed is a method for manufacturing a solar cell having a structure wherein a silicon thin film (52) is formed on a crystalline silicon substrate (50). The manufacturing method is provided with: a thin film forming step, wherein, as a silicon thin film (52), a microcrystalline silicon thin film containing a fine silicon crystal is formed on the crystalline silicon substrate (50) by means of an inductively-coupled plasma CVD in which plasma is generated by inductive coupling; and a water vapor thermal treatment step, wherein the substrate having the microcrystalline silicon thin film formed thereon is thermal-treated under water vapor atmosphere under a pressure of 5×105 Pa or more. |
