| 摘要 |
The invention relates to a device for homothetic projection of a pattern onto the surface of a sample (21) comprising a photosensitive zone. The device comprises means allowing a pattern to be projected onto the surface of the sample, and an optical system (12) allowing the size of the pattern projected onto the surface of the sample to be continuously controlled. The invention also relates to a photolithography method using such a projection device, and to a method and a kit for converting an optical microscope into such a projection device. |
