发明名称 |
METHOD OF PATTERNING A STACK |
摘要 |
The embodiments disclose a method of fabricating a stack, including replacing a metal layer of a stack imprint structure with an oxide layer, patterning the oxide layer stack using chemical etch processes to transfer the pattern image and cleaning etch residue from the stack imprint structure to substantially prevent contamination of the metal layers. |
申请公布号 |
SG2014012660(A) |
申请公布日期 |
2014.05.29 |
申请号 |
SG20140012660 |
申请日期 |
2012.06.11 |
申请人 |
SEAGATE TECHNOLOGY LLC |
发明人 |
FELDBAUM, MICHAEL R.;HWU, JUSTIN JIA-JEN;KUO, DAVID S.;GAUZNER, GENNADY;LEE, KIM YANG;WANG, LI-PING |
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