THE BATCH TYPE APPARATUS FOR HEATING SUBSTRATES

摘要

The present invention relates to a batch type apparatus to heat a substrate which simultaneously transfers substrates into a chamber and heats the substrates at a uniform temperature. A batch type apparatus to heat a substrate according to the present invention includes: a chamber which has an inner space isolated from an outer space; a substrate mounting part installed to be separated from the inner wall of the chamber with a constant distance in the chamber and mounts the substrates to be separated from each other with a constant distance; an air circulation part which is installed on the upper part and the lower part of the substrate mounting part and forcibly circulating air in the chamber; and a high temperature air supply part which supplies circulation air of high temperature into the chamber.