Microlithographic projection exposure apparatus for lithographic production of microstructured components, has traversing device adding functions of optical elements to form overall filter function in first, second and third positions

摘要

The apparatus (10) has a traversing device changing a relative position of two refractive optical elements. The device adds filter functions of the optical elements to form a first overall filter function in a first position, where the absorption coefficient is zero and location independent. The device adds the filter functions of the optical elements to form a second overall filter function in a second position, where the coefficient is non-zero and location-dependent. The device adds the functions of the optical elements to form a third overall filter function in a third position.