发明名称 SYSTEMS AND PROCESSES FOR FORMING THREE-DIMENSIONAL CIRCUITS
摘要 Provided are systems and processes for forming a three-dimensional circuit on a substrate. A radiation source produces a beam that is directed at a substrate having an isolating layer interposed between circuit layers. The circuit layers communicate with reach other via a seed region exhibiting a crystalline surface. At least one circuit layer has an initial microstructure that exhibits electronic properties unsuitable for forming circuit features therein. After being controllably heat treated, the initial microstructure of the circuit layer having unsuitable properties is transformed into one that exhibits electronic properties suitable for forming circuit feature therein. Also provided are three-dimensional circuit structures optionally formed by the inventive systems and/or processes.
申请公布号 KR101400529(B1) 申请公布日期 2014.05.28
申请号 KR20090122081 申请日期 2009.12.09
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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