| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad and method for manufacturing the same, capable of improving the flatness of an object to be polished by improving a polishing rate.SOLUTION: The polishing pad 10 includes longitudinal foams 3 in the thickness direction and a foam body 2 formed with continuous foams 5 therein by the wet film formation method. The foamed body 2 has a region 2a formed with an opening 4 having an opening diameter of 30 μm or less by opening the foam 3 and a region 2b formed with an opening 6 having an opening diameter of 50 μm or more by opening the foam 5, in a polishing surface P. The region 2a and the region 2b are arranged to form a stripe-like pattern in the polishing surface P. During a polishing process, an object to be polished is completely polished in the region 2a and slurry outflow and inflow are promoted in the region 2b. |
