Projection exposure system e.g. EUV projection exposure system for e.g. semiconductor lithography, has shape memory element with martensite start temperature at which transition from martensite state into austenitic state begins

摘要

The system has two frictional interconnected elements (1,2) and shape-memory element (6) that provides frictional connection. The shape memory element has austenite start temperature at which the transition from martensite state to austenitic state begins, austenite finish temperature at which the memory element is completely in austenitic state. - The shape memory element has martensite start temperature at which the transition from martensite state into austenitic state begins and martensite finish temperature at which memory element is located in martensite state.