SUBSTRATE PROCESSING APPARATUS

摘要

A substrate processing apparatus of the present invention comprises: a processing chamber in which an opening is provided on one side and a deposition process takes places on a substrate; a vacuum device which creates a vacuum environment inside of the processing chamber through the opening of the processing chamber; and a heat blocking device which is disposed between the processing chamber and the vacuum device, and blocks radiant heat generated during the deposition process of the processing chamber from flowing into the vacuum device.