发明名称 |
A PHOTOELECTRON SPECTROSCOPY APPARATUS AND METHOD OF USE |
摘要 |
According to one aspect of the present invention, a substrate processing system is provided. The system may include a chamber wall enclosing a chamber, a substrate support positioned within the chamber to support a substrate, an electromagnetic radiation source to emit electromagnetic radiation onto the substrate on the substrate support, the electromagnetic radiation causing photoelectrons to be emitted from a material on the substrate, an analyzer to capture the photoelectrons emitted from the substrate, and a magnetic field generator to generate a magnetic field within the chamber and guide the photoelectrons from the substrate to the analyzer. |
申请公布号 |
EP1929258(A4) |
申请公布日期 |
2014.05.28 |
申请号 |
EP20060814252 |
申请日期 |
2006.09.08 |
申请人 |
REVERA INCORPORATED |
发明人 |
SCHUELER, BRUNO, W.;REED, DAVID, A. |
分类号 |
G01J3/42;G01N21/62;H01J1/50;H01J40/00;H01L21/67 |
主分类号 |
G01J3/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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