发明名称 A PHOTOELECTRON SPECTROSCOPY APPARATUS AND METHOD OF USE
摘要 According to one aspect of the present invention, a substrate processing system is provided. The system may include a chamber wall enclosing a chamber, a substrate support positioned within the chamber to support a substrate, an electromagnetic radiation source to emit electromagnetic radiation onto the substrate on the substrate support, the electromagnetic radiation causing photoelectrons to be emitted from a material on the substrate, an analyzer to capture the photoelectrons emitted from the substrate, and a magnetic field generator to generate a magnetic field within the chamber and guide the photoelectrons from the substrate to the analyzer.
申请公布号 EP1929258(A4) 申请公布日期 2014.05.28
申请号 EP20060814252 申请日期 2006.09.08
申请人 REVERA INCORPORATED 发明人 SCHUELER, BRUNO, W.;REED, DAVID, A.
分类号 G01J3/42;G01N21/62;H01J1/50;H01J40/00;H01L21/67 主分类号 G01J3/42
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