发明名称 Nitride based semiconductor device and method for manufacturing the same
摘要 Disclosed herein is a nitride based semiconductor device including: a base substrate; an epitaxial growth layer disposed on the base substrate and generating a 2-dimensional electron gas in an inner portion thereof; and an electrode structure disposed on the epitaxial growth layer, wherein the electrode structure includes: a gate electrode; a source electrode disposed at one side of the gate electrode; and a drain electrode disposed at the other side of the gate electrode and having an extension part extended to the inner portion of the epitaxial growth layer to contact the 2-dimensional electron gas.
申请公布号 US8735941(B2) 申请公布日期 2014.05.27
申请号 US201113049594 申请日期 2011.03.16
申请人 PARK KIYEOL;JEON WOOCHUL;PARK YOUNGHWAN;SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 PARK KIYEOL;JEON WOOCHUL;PARK YOUNGHWAN
分类号 H01L29/66;H01L27/148 主分类号 H01L29/66
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