发明名称 |
CONDUCTIVE FILM FORMING METHOD, COPPER FINE PARTICLE-DISPERSED LIQUID, AND CIRCUIT BOARD |
摘要 |
<p>An object is to provide a conductive film forming method which can form a conductive film having low electric resistance on a base material by utilizing photo sintering even when the base material has low heat resistance. A conductive film forming method is a method in which a conductive film 2 is formed on a base material 1, and the method includes the steps of forming a film 3b composed of copper particulates 4 on a base material, subjecting the film 3b to photo sintering, and applying plating to the photo-sintered film 3c. Whereby, it is possible to form a conductive film 2 on a base material 1 by lowering irradiation energy of light in photo sintering even when the base material 1 has low heat resistance. Since the conductive film 2 includes a plated layer 21, electric resistance decreases.</p> |
申请公布号 |
KR20140063766(A) |
申请公布日期 |
2014.05.27 |
申请号 |
KR20147009004 |
申请日期 |
2012.08.13 |
申请人 |
ISHIHARA CHEMICAL CO., LTD.;APPLIED NANOTECH HOLDINGS, INC. |
发明人 |
KAWATO YUICHI;MITA TOMOHIRO;MAEDA YUSUKE;KUDO TOMIO |
分类号 |
H05K3/12;H05K3/18 |
主分类号 |
H05K3/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|