发明名称 CONDUCTIVE FILM FORMING METHOD, COPPER FINE PARTICLE-DISPERSED LIQUID, AND CIRCUIT BOARD
摘要 <p>An object is to provide a conductive film forming method which can form a conductive film having low electric resistance on a base material by utilizing photo sintering even when the base material has low heat resistance. A conductive film forming method is a method in which a conductive film 2 is formed on a base material 1, and the method includes the steps of forming a film 3b composed of copper particulates 4 on a base material, subjecting the film 3b to photo sintering, and applying plating to the photo-sintered film 3c. Whereby, it is possible to form a conductive film 2 on a base material 1 by lowering irradiation energy of light in photo sintering even when the base material 1 has low heat resistance. Since the conductive film 2 includes a plated layer 21, electric resistance decreases.</p>
申请公布号 KR20140063766(A) 申请公布日期 2014.05.27
申请号 KR20147009004 申请日期 2012.08.13
申请人 ISHIHARA CHEMICAL CO., LTD.;APPLIED NANOTECH HOLDINGS, INC. 发明人 KAWATO YUICHI;MITA TOMOHIRO;MAEDA YUSUKE;KUDO TOMIO
分类号 H05K3/12;H05K3/18 主分类号 H05K3/12
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