| 发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER PREPARED BY USING THE SAME, AND SEMICONDUCTOR DEVICE INCLUDING THE PHOTOSENSITIVE RESIN LAYER |
| 摘要 |
<p>Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a novolac resin including a repeating unit represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, a photosensitive resin film prepared by using the positive photosensitive resin composition, and a semiconductor device including the photosensitive resin film.</p> |
| 申请公布号 |
KR101400186(B1) |
申请公布日期 |
2014.05.27 |
| 申请号 |
KR20100140593 |
申请日期 |
2010.12.31 |
| 申请人 |
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发明人 |
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| 分类号 |
G03F7/016;G03F7/039;H01L21/027 |
主分类号 |
G03F7/016 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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