发明名称 |
Positive resist composition and patterning process |
摘要 |
A polymer obtained from copolymerization of a recurring unit having a carboxyl group and/or phenolic hydroxyl group substituted with an acid labile group with a methacrylate having a phenolic hydroxyl-bearing pyridine is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure. |
申请公布号 |
US8735046(B2) |
申请公布日期 |
2014.05.27 |
申请号 |
US201113300894 |
申请日期 |
2011.11.21 |
申请人 |
HATAKEYAMA JUN;HASEGAWA KOJI;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;HASEGAWA KOJI |
分类号 |
G03F7/039;G03F7/20;G03F7/30;G03F7/38 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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