发明名称 |
Method and apparatus for electron pattern imaging |
摘要 |
A system for electron pattern imaging includes: a device for converting electron patterns into visible light provided to receive an electron backscatter diffraction (EBSD) pattern from a sample and convert the EBSD pattern to a corresponding light pattern; a first optical system positioned downstream from the device for converting electron patterns into visible light for focusing the light pattern produced by the device for converting electron patterns into visible light; a camera positioned downstream from the first optical system for obtaining an image of the light pattern; an image intensifier positioned between the device for converting electron patterns into visible light and the camera for amplifying the light pattern produced by the device for converting electron patterns into visible light; and a device positioned within the system for protecting the image intensifier from harmful light. |
申请公布号 |
US8735815(B2) |
申请公布日期 |
2014.05.27 |
申请号 |
US201313924786 |
申请日期 |
2013.06.24 |
申请人 |
EDAX, INC. |
发明人 |
BUCHHOLD REINHARD;HAMMELL BRENT;NICOLOSI JOSEPH A.;DE KLOE PETER ANTONIE |
分类号 |
G01N23/00;G21K7/00 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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