发明名称 Etching resist
摘要 An etching resist has a first heat-generating layer, a second heat-generating layer, and a metal compound layer including a metallic oxynitride layer containing a metallic oxynitride. The first heat-generating layer, the metallic oxynitride layer, and the second heat-generating layer are directly or indirectly laminated such that the metallic oxynitride layer is positioned between the first heat-generating layer and the second heat-generating layer.
申请公布号 US8734964(B2) 申请公布日期 2014.05.27
申请号 US20090638349 申请日期 2009.12.15
申请人 KURIHARA KAZUMA;NAKANO TAKASHI;SHIMA TAKAYUKI;TOMINAGA JUNJI;FUJIOKA KAZUYA;SUEHIRO ICHIRO;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;NITTO DENKO CORPORATION 发明人 KURIHARA KAZUMA;NAKANO TAKASHI;SHIMA TAKAYUKI;TOMINAGA JUNJI;FUJIOKA KAZUYA;SUEHIRO ICHIRO
分类号 B32B3/00;C01B21/20;C23F1/00;C23F1/08 主分类号 B32B3/00
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