发明名称 DEPOSITION APPARATUS CONTAINING MOVING DEPOSITION SOURCE
摘要 In a deposition apparatus for depositing a thin film on the surface of a coating object in a vacuum chamber, the deposition apparatus comprises a deposition source supplying materials for forming a thin film; a supply unit for supplying at least one among cooling water, electric power and process gas to the deposition source; and a transporting unit for moving the deposition source in the vacuum chamber.
申请公布号 KR20140062951(A) 申请公布日期 2014.05.27
申请号 KR20120129289 申请日期 2012.11.15
申请人 BMC CO., LTD.;HONG CHARLIE;LEE, MAN HO 发明人 HONG CHAR LIE;LEE, MAN HO
分类号 C23C14/24;C23C16/448 主分类号 C23C14/24
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