发明名称 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE
摘要 The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.
申请公布号 KR101398754(B1) 申请公布日期 2014.05.27
申请号 KR20137016531 申请日期 2009.12.16
申请人 发明人
分类号 G03F7/023;G03F7/039;G03F7/40;H01L21/027 主分类号 G03F7/023
代理机构 代理人
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