| 摘要 |
A substrate cleaning device capable of cleaning a substrate by continuously supplying a cleaning solution, in which a pure medicine fluid and a plurality of medicine fluids are equally mixed with each other, to the substrate from the time when the cleaning begins. The substrate cleaning device includes a pure supply line (50) having a pure flux controller (56a) and a pure supply valve (58a); a plurality of medicine fluid supply lines (52, 54) having medicine fluid flux controllers (56b, 56c) and medicine fluid supply valves (58b, 58c), respectively; a joining line (66) making a cleaning solution by mixing the pure medicine fluid with the medicine fluids; and a control part (30) controlling cleaning solution supply lines (42,44,68) supplying the cleaning solution to the substrate, flux controllers (56a, 56b, 56c), and supply valves (58a, 58b, 58c) in order to make a predetermined ratio of the pure medicine fluid with the medicine fluids at a point of the joining of the pure medicine fluid and the medicine fluids. |
