| 摘要 |
A method of fabricating a microelectronic unit can include providing a semiconductor element having front and rear surfaces, a plurality of conductive pads each having a top surface exposed at the front surface and a bottom surface remote from the top surface, and a first opening extending from the rear surface towards the front surface. The method can also include forming at least one second opening extending from the first opening towards the bottom surface of a respective one of the pads. The method can also include forming a conductive via, a conductive interconnect, and a contact, the conductive via in registration with and in contact with the conductive pad and extending within the second opening, the contact exposed at an exterior of the microelectronic unit, the conductive interconnect electrically connecting the conductive via with the contact and extending away from the via at least partly within the first opening. |
