| 摘要 |
The present invention relates to an etchant composition of multiple layers composed of a single layer of Ag or Ag alloy or the single layer and an indium oxide layer. The etchant composition of the multiple layers contains nitric acid, sulfuric acid, persulfate, organic acid salts, and water and does not contain phosphoric acid. The etchant composition contains nitric acid of 5.0-8.0 wt%, sulfuric acid of 5.0-8.0 wt%, persulfate of 1.0-5.0 wt%, organic acid salt of 0.5-3.0 wt%, and water of 76.0-88.5 wt%. |
