发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>A semiconductor device includes a first conductive layer; at least one first slit which penetrates the first conductive layer and divides the first conductive layer into memory block units; second conductive layers which are stacked in the upper part of the first conductive layer; and at least one second silt which penetrates the second conductive layers in a position which is different from that of the first slit and divides the second conductive layers into memory block units.</p> |
申请公布号 |
KR20140062636(A) |
申请公布日期 |
2014.05.26 |
申请号 |
KR20120128765 |
申请日期 |
2012.11.14 |
申请人 |
SK HYNIX INC. |
发明人 |
LEE, KI HONG;PYI, SEUNG HO;PARK, IN SU |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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