发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A semiconductor device includes a first conductive layer; at least one first slit which penetrates the first conductive layer and divides the first conductive layer into memory block units; second conductive layers which are stacked in the upper part of the first conductive layer; and at least one second silt which penetrates the second conductive layers in a position which is different from that of the first slit and divides the second conductive layers into memory block units.</p>
申请公布号 KR20140062636(A) 申请公布日期 2014.05.26
申请号 KR20120128765 申请日期 2012.11.14
申请人 SK HYNIX INC. 发明人 LEE, KI HONG;PYI, SEUNG HO;PARK, IN SU
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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