发明名称 VAPOR DEPOSITION APPARATUS, METHOD OF FORMING THIN FILM USING THE SAME AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS
摘要 A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.
申请公布号 US2014141154(A1) 申请公布日期 2014.05.22
申请号 US201313795399 申请日期 2013.03.12
申请人 KIM JIN-KWANG;SONG SEUNG-YONG;HUH MYUNG-SOO;JUNG SUK-WON;JANG CHOEL-MIN;KIM JAE-HYUN;KIM SUNG-CHUL 发明人 KIM JIN-KWANG;SONG SEUNG-YONG;HUH MYUNG-SOO;JUNG SUK-WON;JANG CHOEL-MIN;KIM JAE-HYUN;KIM SUNG-CHUL
分类号 H01B13/30;H01B13/06 主分类号 H01B13/30
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