发明名称 SYSTEM AND METHOD FOR SELECTIVELY REMOVING ATOMS
摘要 A method for selective removal of atoms from a substrate: comprising forming a patterned mask over at least a portion of the surface of the substrate to form a masked portion and an unmasked portion of the surface; exposing the surface to low energy light ions, wherein the low energy light ions selectively remove atoms from the unmasked portion of the substrate. The method creates a plurality of magnetic domains on a magnetically susceptible substrate to form a magnetic medium such as magnetic memory devices.
申请公布号 WO2014078800(A1) 申请公布日期 2014.05.22
申请号 WO2013US70593 申请日期 2013.11.18
申请人 LITVINOV, DMITRI;CHANG, LONG 发明人 LITVINOV, DMITRI;CHANG, LONG
分类号 H01L21/8234;C23F4/00;H01L21/265 主分类号 H01L21/8234
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