发明名称 |
SYSTEM AND METHOD FOR SELECTIVELY REMOVING ATOMS |
摘要 |
A method for selective removal of atoms from a substrate: comprising forming a patterned mask over at least a portion of the surface of the substrate to form a masked portion and an unmasked portion of the surface; exposing the surface to low energy light ions, wherein the low energy light ions selectively remove atoms from the unmasked portion of the substrate. The method creates a plurality of magnetic domains on a magnetically susceptible substrate to form a magnetic medium such as magnetic memory devices. |
申请公布号 |
WO2014078800(A1) |
申请公布日期 |
2014.05.22 |
申请号 |
WO2013US70593 |
申请日期 |
2013.11.18 |
申请人 |
LITVINOV, DMITRI;CHANG, LONG |
发明人 |
LITVINOV, DMITRI;CHANG, LONG |
分类号 |
H01L21/8234;C23F4/00;H01L21/265 |
主分类号 |
H01L21/8234 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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