| 摘要 |
The invention discloses an apparatus and methods of spectrum base monitoring for chemical mechanical polishing, comprising detecting a spectrum base terminal, adjusting a spectrum base polishing rate and washing an upper surface of an optical head or a gasket with a window. The spectrum base terminal detection selects a reference spectrum for a specific spectrum base terminal determining logic according to an experience rule, and accordingly a terminal is determined by using the specific spectrum base terminal determining logic, i.e., a target thickness is obtained. A polishing terminal can be determined by utilizing a difference picture or a series of indicator values. A washing system generates laminar flow on the surface of an optical head. A vacuum spraying hole and a vacuum source are configured to make airflow be in a laminar flow state. The window comprises a soft plastic part and a crystallized or glass part. The spectrum base polishing rate adjustment comprises obtaining spectrum in different areas on basic materials. |
