发明名称 |
LOCAL TAILORING OF FINGERS IN MULTI-FINGER FIN FIELD EFFECT TRANSISTORS |
摘要 |
A cluster of semiconductor fins is formed on an insulator layer. A masking material layer is formed over the array of semiconductor fins such that spaces between adjacent semiconductor fins are filled with the masking material layer. A photoresist layer is applied over the masking material layer, and is lithographically patterned. The masking material layer is etched to physically expose a sidewall surface of a portion of an outermost semiconductor fin in regions not covered by the photoresist layer. A recessed region is formed in the insulator layer such that an edge of the recessed region is formed within an area from which a portion of the semiconductor fin is removed. The photoresist layer and the masking material layer are removed. Within the cluster, a region is provided that has a lesser number of semiconductor fins than another region in which semiconductor fins are not etched. |
申请公布号 |
US2014141578(A1) |
申请公布日期 |
2014.05.22 |
申请号 |
US201313741978 |
申请日期 |
2013.01.15 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BRINK MARKUS;CHANG JOSEPHINE B.;GUILLORN MICHAEL A.;TSAI HSINYU |
分类号 |
H01L21/8234 |
主分类号 |
H01L21/8234 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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