发明名称 NONVOLATILE MEMORY ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 A nonvolatile memory element includes a first and a second electrode layers, and a variable resistance layer provided between the first and the second electrode layers and having a resistance value reversibly changing according to application of an electrical pulse, wherein the variable resistance layer includes a first variable resistance layer contacting the first electrode layer and comprising an oxygen-deficient first metal oxide, and a second variable resistance layer contacting the first variable resistance layer and comprising a second metal oxide having a smaller oxygen deficiency than the first metal oxide, and including host layers and an inserted layer between each of adjacent pairs of the host layers, wherein the second metal oxide of the inserted layer has a larger oxygen deficiency than the second metal oxide of the host layer, and the first metal oxide has a larger oxygen deficiency than the second metal oxide of the host layer.
申请公布号 US2014138599(A1) 申请公布日期 2014.05.22
申请号 US201314082237 申请日期 2013.11.18
申请人 PANASONIC CORPORATION 发明人 FUJII SATORU;MIKAWA TAKUMI
分类号 H01L45/00 主分类号 H01L45/00
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