METHOD FOR PRODUCING THIN FILM CONTAINING MOLYBDENUM, THIN FILM-FORMING STARTING MATERIAL, AND MOLYBDENUM IMIDE COMPOUND

摘要

This method for producing a thin film forms a thin film containing molybdenum on a substrate by introducing a vapor, which contains a molybdenum imide compound that is obtained by vaporizing a thin film-forming starting material containing a molybdenum imide compound represented by general formula (I), over the substrate and subjecting the vapor to decomposition and/or a chemical reaction. A thin film-forming starting material of the present invention contains a molybdenum imide compound represented by general formula (I). (In the formula, each of R1-R10 represents a hydrogen atom or a linear or branched alkyl group having 1-5 carbon atoms; and R11 represents a linear or branched alkyl group having 1-8 carbon atoms.)