| 摘要 |
Techniques disclosed herein include apparatus and processes for generating a plasma having a uniform electron density across an electrode used to generate the plasma. An upper electrode (hot electrode), of a capacitively coupled plasma system can include structural features configured to assist in generating the uniform plasma. Such structural features define a surface shape, on a surface that faces the plasma. Such structural features can include a set of concentric rings having an approximately rectangular cross section, and protruding from the surface of the upper electrode. Such structural features can also include nested elongated protrusions having a cross-sectional size and shape, with spacing of the protrusions selected to result in a system that generates a uniform density plasma. |
