METHOD OF FORMING A STEP SHAPE PATTERN

摘要

The present invention is a method of forming a step shape pattern. According to the method, an etching target layer is formed on a substrate. Photoresist patterns which have different photoresist properties are alternately stacked on the etching target layer. A photoresist structure which has an edge part of a step shape is formed. The etching target layer is etched by using the photoresist structure as an etching mask to form a step shape pattern. By doing so, the number of etching processes is reduced and thereby the step shape pattern can be formed by a simple process.