发明名称 |
STAGE DEVICE AND METHOD FOR ADJUSTING THE SAME, EXPOSURE SYSTEM, AND METHOD FOR MANUFACTURING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a stage device capable of measuring the rotation of a stage at high accuracy.SOLUTION: A stage device includes: a stage 1; an interference measuring instrument 4 arranged so that the position of a surface of a mirror 12 disposed on a side face of the stage can be measured; a drive part 205 positioning the stage on the basis of a measurement result obtained by the interference measuring instrument. The interference measuring instrument includes: a varying part 16 periodically varying an incident position where measuring light enters the mirror; and a detecting part 14 detecting the rotation of the mirror on the basis of the variation amount of a measurement result obtained by the interference measuring instrument, the variation amount being generated in accordance with a periodical variation of the incident position. |
申请公布号 |
JP2014096456(A) |
申请公布日期 |
2014.05.22 |
申请号 |
JP20120246663 |
申请日期 |
2012.11.08 |
申请人 |
CANON INC |
发明人 |
HAMATANI ZENICHI;EMOTO KEIJI;TAKAI AKIRA;HIRAI SHINICHIRO |
分类号 |
H01L21/027;G01B11/26;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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