发明名称 STAGE DEVICE AND METHOD FOR ADJUSTING THE SAME, EXPOSURE SYSTEM, AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a stage device capable of measuring the rotation of a stage at high accuracy.SOLUTION: A stage device includes: a stage 1; an interference measuring instrument 4 arranged so that the position of a surface of a mirror 12 disposed on a side face of the stage can be measured; a drive part 205 positioning the stage on the basis of a measurement result obtained by the interference measuring instrument. The interference measuring instrument includes: a varying part 16 periodically varying an incident position where measuring light enters the mirror; and a detecting part 14 detecting the rotation of the mirror on the basis of the variation amount of a measurement result obtained by the interference measuring instrument, the variation amount being generated in accordance with a periodical variation of the incident position.
申请公布号 JP2014096456(A) 申请公布日期 2014.05.22
申请号 JP20120246663 申请日期 2012.11.08
申请人 CANON INC 发明人 HAMATANI ZENICHI;EMOTO KEIJI;TAKAI AKIRA;HIRAI SHINICHIRO
分类号 H01L21/027;G01B11/26;G03F7/20;H01L21/68 主分类号 H01L21/027
代理机构 代理人
主权项
地址