| 摘要 |
PROBLEM TO BE SOLVED: To manufacture effectively a pattern film having stripe pattern that each line width and interval between lines are highly precise.SOLUTION: A manufacturing installation manufactures a pattern phase difference film. An exposure equipment arranged to the manufacturing installation irradiates lighting from a light source unit through a mask unit 31 to a film in consecutive conveying. The mask unit 31 has a first mask 41a and a second mask 42a arranged with an interval D and formed multiple slits 41s and 42s lining to a cross direction of a film 18 respectively. The first mask 41a and the second mask 42a are put together so that each slits 41s and 42s completely overlap in a light path of the lighting. |
