发明名称 dielectric doping using high productivity combinatorial methods
摘要 A combination of deposition processes can be used to evaluate layer properties using a combinatorial workflow. The processes can include a base ALD process and another process, such as a PVD process. The high productivity combinatorial technique can provide an evaluation of the material properties for given ALD base layer and PVD additional elements. An ALD process can then be developed to provide the desired layers, replacing the ALD and PVD combination.
申请公布号 US2014141534(A1) 申请公布日期 2014.05.22
申请号 US201213680701 申请日期 2012.11.19
申请人 INTERMOLECULAR INC. 发明人 PHATAK PRASHANT B.;ANANTHAN VENKAT;FRENCH WAYNE R.
分类号 H01L21/66;H01L21/3105 主分类号 H01L21/66
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