| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film forming device capable of cleaning easily an electrode unit without plasma cleaning, to thereby reduce device cost, and improving the operation rate of the device.SOLUTION: A thin film forming device 1 in which raw material gas is supplied into a chamber 2 for storing a substrate W and an electrode unit 3 for generating plasma, and the raw material gas is exposed to a plasma environment formed in the chamber, to thereby form a thin film on the substrate, is constituted as follows: the electrode unit has an electrode part formed of a conductor and a dielectric part positioned in the chamber, and a peelable film 7 which is peelable by wiping is formed at least on a part where the dielectric part is positioned in the chamber. |
