发明名称 APPARATUS FDR TREATING SUBSTRATES
摘要 The present invention relates to a substrate treating device and, more specifically, to a device for discharging liquid droplets of liquid crystals, polyimide (PI), and color filters (CF) onto a substrate through an inkjet technique. The substrate treating device according to an embodiment of the present invention comprises: a substrate support member for supporting a substrate; a nozzle unit that includes one or more nozzles that spray a treating liquid onto the substrate that is supported by means of the substrate support member; and a discharge amount measuring unit for measuring the discharge amount of the treated liquid that is discharged from the nozzles. The discharge amount measuring unit comprises: a stage for providing a space in which the discharge amount of the treating liquid is measured; a discharge plate that is disposed in the stage and discharges the treating liquid; a photographing member that photographs an area to which the treating liquid is discharged from the discharge plate; and a calculator that calculates the discharge amount of the treating liquid from the image photographed by means of the photographing member. The stage has a fixing groove that is downwardly concave, and the discharge plate is disposed in the fixing groove.
申请公布号 KR20140060819(A) 申请公布日期 2014.05.21
申请号 KR20120127611 申请日期 2012.11.12
申请人 SEMES CO., LTD. 发明人 KIM, CHEOL WOO;LEE, EUN CHEOL
分类号 B05C5/02;G02F1/13 主分类号 B05C5/02
代理机构 代理人
主权项
地址