发明名称 |
CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN |
摘要 |
Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom. |
申请公布号 |
EP2732460(A1) |
申请公布日期 |
2014.05.21 |
申请号 |
EP20120811906 |
申请日期 |
2012.07.09 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KODAMA, KUNIHIKO;ENOMOTO, YUICHIRO;USUKI, KAZUYUKI;OMATSU, TADASHI;KITAGAWA, HIROTAKA |
分类号 |
H01L21/027;B29C59/02;C08F2/44;C08F2/48;C08F220/10;C09D4/06;G11B5/84 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|