METHOD FOR THE PURIFICATION OF CORROSIVE GASES

摘要

The present invention relates to a novel process for the preparation of high-purity chemicals with an extremely low particle count, such as ammonia gas, hydrogen fluoride and hydrogen chloride, which are also used as aqueous solutions in semiconductor technology the corrosive gas is enriched with an absorbent which is miscible with the gas and in which impurities present in the gas are soluble, and the gas is subsequently subjected to membrane filtration.