| 摘要 |
An apparatus for secondary ion mass spectrometry is provided having a target surface for supporting a sample on the target surface and an ion source configured to direct a beam of primary ions toward the sample to sputter secondary ions and neutral particles from the sample, A first chamber having an inlet provides gas to maintain high pressure at the sample for cooling the secondary ions and neutral particles, the high pressure being in the range of about 10−3 to about 1000 Torr. A method of secondary ion mass spectrometry is provided having a target surface for supporting a sample, directing a beam of primary ions toward the sample to sputter secondary ions and neutral particles from the sample, and providing a high pressure at the sample for cooling the secondary ions and neutral particles, the high pressure being in the range of about 10−3 to about 1000 Torr. |
