发明名称 |
Method and device for inspecting wafers |
摘要 |
<p>The method involves providing the wafers (6,7) to-be-inspected. The wafer (6) is passed through the through-flow path (9) to a reversal position. The second wafer (7) is passed over the through-flow path to a return position, while passing the inspected wafer (6) to a decrease station (40). The inspected wafer (6) is fed behind the wafer (7) to the end of the through-flow path. The wafer (6) is fed over the through-flow path to reversal position while passing the inspected wafer (7) to a decrease station (41). An independent claim is included for device for inspecting wafer.</p> |
申请公布号 |
EP2733732(A1) |
申请公布日期 |
2014.05.21 |
申请号 |
EP20130005309 |
申请日期 |
2013.11.11 |
申请人 |
MUETEC AUTOMATISIERTE MIKROSKOPIE UND MESSTECHNIKGMBH |
发明人 |
SCHEURING, GERD;AMMERL, JOSEF |
分类号 |
H01L21/67;H01L21/68;H01L21/687 |
主分类号 |
H01L21/67 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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