发明名称 Method and device for inspecting wafers
摘要 <p>The method involves providing the wafers (6,7) to-be-inspected. The wafer (6) is passed through the through-flow path (9) to a reversal position. The second wafer (7) is passed over the through-flow path to a return position, while passing the inspected wafer (6) to a decrease station (40). The inspected wafer (6) is fed behind the wafer (7) to the end of the through-flow path. The wafer (6) is fed over the through-flow path to reversal position while passing the inspected wafer (7) to a decrease station (41). An independent claim is included for device for inspecting wafer.</p>
申请公布号 EP2733732(A1) 申请公布日期 2014.05.21
申请号 EP20130005309 申请日期 2013.11.11
申请人 MUETEC AUTOMATISIERTE MIKROSKOPIE UND MESSTECHNIKGMBH 发明人 SCHEURING, GERD;AMMERL, JOSEF
分类号 H01L21/67;H01L21/68;H01L21/687 主分类号 H01L21/67
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