| 摘要 |
An exposure apparatus of the present invention is provided with: a discharge lamp, which radiates light that includes emission lines, i.e., the g line (436 nm), the h line (405 nm) and the i line (365 nm); a light measuring means, which has a light receiving section, and measures the light radiated from the discharge lamp; and an illumination adjusting means, which, on the basis of a measurement value obtained from the light measuring means, adjusts power to be supplied to the discharge lamp. The light measuring means has spectral sensitivity characteristics having peak sensitivities between two adjacent emission lines among the g line, the h line and the i line. |
