发明名称 Compound semiconductor device, method for manufacturing the device and electric device
摘要 A compound semiconductor device includes: a compound semiconductor multilayer structure; a gate insulating film on the compound semiconductor multilayer structure; and a gate electrode, wherein the gate electrode includes a gate base portion on the gate insulating film and a gate umbrella portion, and a surface of the gate umbrella portion includes a Schottky contact with the compound semiconductor multilayer structure.
申请公布号 US8729604(B2) 申请公布日期 2014.05.20
申请号 US201113334734 申请日期 2011.12.22
申请人 KURAHASHI NAOKO;FUJITSU LIMITED 发明人 KURAHASHI NAOKO
分类号 H01L29/778;H01L29/772 主分类号 H01L29/778
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