Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

摘要

A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom,—NR′—,—CO—O—# or—SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′represents a hydrogen atom or an alkali-labile group, and“#”and“##”indicates a bonding hand bonded to R1. -A-R1  (x)